So here's what I'm hearing: the "partial stacking" is a bit like having lanes of lanes. You have multiple column-based ADCs feeding each "stacked" pass-along. Nikon uses the terminology of "multiple check-out lanes" (a grocery store analogy!). It's not the same as the Z8/Z9 stacking, nor does it do a separate viewfinder stream.
That makes sense, but I'm guessing that the ADCs are on the stacked ICs. That would allow the use of a silicon process optimized for ADC performance without the compromises required for optimum sensor performance.
My first thought was that
only the capacitors for the ADCs are on the "stacked" part, as well maybe some power-conditioning caps/inductors. That is, my guess is that there are no active semiconductors (no diodes, no transistors) in the stacked bits.
The advantage of this is that
you can build up the stacked bits on the otherwise-finished sensor using relatively low-temperature processes that don't run the risk of damaging the silicon part of the sensor. For example, you can just lay down polyimide and aluminum to form the capacitors and the connections to and between them. No need for high-temperature annealing, or ion implantation, or planarization, or any other of those harsh processes that go into fabricating semiconductors. This is probably a lot cheaper to do than actually stacking another die on the sensor; in fact
it may be no more difficult than adding the Bayer filter.
Capacitors in a cap-based ADC chew up a lot of area, so
moving the caps off of the silicon gives you more room for the active components of the ADCs, and therefor makes it easier to provide more channels of parallel ADC conversion. There may be other advantages too, like enabling less cross-talk between capacitors, providing higher capacitance values, or improving the Q of the circuits.
But until I can at least put a stacked sensor under a microscope or saw through one to get a cross section, all I can do is speculate.